Metrology
 
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Àåºñ¸í SDI/SEMILAB FAaST 230 Non-contact CV/IV Measurement System
¸ðµ¨¸í FAaST 230 Á¦Á¶»ç SDI/SEMILAB
¿þÀÌÆÛ»çÀÌÁî 8" Vintage -
¸Å¸Å»óÅ ÆǸÅÁß Àåºñ»óÅ AS-IS
Á¦¿ø . Up to 8"
. Automatic robotic wafer handling
. Single open-cassette wafer loading station
. Measurement of dielectric and interface properties on monitor wafer
- Dielectric Capacitance (CD) and Thickness (EOT)
- Dielectric Leakage Current (I-V)
- Flatband Voltage (Vfb)
- Interface Trap Density (Dit)
- Interface Trapped Charge (Qit)
- Semiconductor Surface Barrier (Vsb)
- Oxide Total Charge (Qtot)
- Mobile Ionic Charge (Qm), among others
. Suitable for measurement on:
- Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)
       
  - Ãæû³²µµ õ¾È½Ã µ¿³²±¸ ÅëÁ¤3·Î 3 (ÁÖ)Á¦³×½Ã½º ¿ì)31208 TEL: 041-554-6920~1 FAX: 041-554-6922