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Tool's Specification.
Tool Name Nanometrics Nanospec 210 Thin Film Thickness measurement
Model 210 Maker NANOMETRICS
Wafer Size 8" Vintage -
Sell Status SELL Tool's Condition Refurbishing
Description *. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.

*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
     
  - Address: 3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
  - Phone: 82-41-554-6920~1 FAX: 82-41-554-6922