Metrology
 
 HOME >设备信息
设备信息
设备名称 Nanometrics Nanospec 210 Thin Film Thickness measurement
型号 210 制造商 NANOMETRICS
晶元尺寸 8" Vintage -
销售状态 销售中 设备状态 Refurbishing
数据 *. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.

*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
     
  - 总公司: 3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
  - 电话: 82-41-554-6920~1 传真: 82-41-554-6922