Metrology
 
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设备信息
设备名称 N&K 8000 CD Trench Depth & Thin film thickness Measurement
型号 N&K Little foot 8000 CD 制造商 N&K
晶元尺寸 8" Vintage 2007-
销售状态 销售中 设备状态 Operational
数据 Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers

DUV - Vis - NIR: 190nm to 1000nm
Reflectance, Polarized
Analyzer Unit with spot size : 50 um
Cognex Pattern Recognition Software
Windows 7 Operating System
S/W Version : 10.5.3.0
n&k's Thin Film Characterization S/W
n&k's Standard Films Library
Automated Wafer Loading/Unloading
Assyst Loadport for 8" Wafers
Computerized X-Y stage for full wafer mapping,and wafer alignment capability
Z-stage to acccommodate multiple substrate thickness
SEMI and CE Certification
Application :
Simultaneously determines thickness, n and k of thin films including semiconductors,dielectronics (SiO2, Si3N4),etc, Polymers (Photoresist,etc),and very thin metals

- Thin Film : Film Thickness / n and k
- OCD : Depth / CD / Profile
 
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